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Sol-Gel 공정을 이용한 ZnO 쇼트키 다이오드의 제작 및 특성평가
Fabrication and Characterization of ZnO Schottky Diode Using Sol-Gel Process
이득희 ( Deuk Hee Lee ) , 김경원 ( Kyoung Won Kim ) , 박기호 ( Ki Ho Park ) , 김상식 ( Sang Sig Kim ) , 이상렬 ( Sang Yeol Lee )
UCI I410-ECN-0102-2015-500-001798138
이 자료는 4페이지 이하의 자료입니다.

We fabricate Schottky diodes with the contact between a sol-gel derived ZnO layer and Au that guarantees the expected Schottky contact due to the high work function. The formed single metal Schottky barrier shows characteristics comparable to the barrier formed by alloys. Au is deposited by thermal evaporation on a ZnO thin film that is optimally formed under sol-gel process conditions of a 1-mol zinc acetate concentration and a 3000-rpm coating speed. Possible defects. which can provide deleterious current paths. are minimized by patterning the deposited Au. The I-V curve verifies the formation of a Schottky contact. Measurements showed that the Schottky barrier height and leakage current at -5 V were 0.6 eV and 1×10-12A. respectively.

[자료제공 : 네이버학술정보]
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