Self-assembly of building blocks is one of "bottom-up"approaches, which a considerable number of studies have been conducted on. Especially, block copolymer and supramolcules are major part of there studies for fabrication of 2D nanopetterns, due to simple control of pattern size and low-cost parallel processes. In this work, the ordered nanopatterns of metal dot arrays available for magneticstorage device, was successfully fabricated by self-assembly of block copolymer. The process route consists of only several steps, and is cost-effective by parallel processing, e.g., reactive ion etching (RIE) andelectron-beam (E-beam) deposition. And more higher integration, supramolecules was used with the characteristic dimension of several nanometer scale. The nanopatterns fabricated by self-assembly of supramolecules showed the possibility for nanolithography.