닫기
18.97.14.85
18.97.14.85
close menu
한일 13
High resolution microscopy for amorphous formation in ion-irradiated Si crystalline
( S . Ohnuki ) , ( M . Takeda ) , ( S . Suzuki ) , ( F . Arimoto ) , ( S . Watanabe ) , ( H . Takahashi )
UCI I410-ECN-0102-2009-580-009425993
This article is 4 pages or less.
×