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한국어
ENG
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한국공업화학회
공업화학전망
CMP 기술의 현황과 전망
CMP 기술의 현황과 전망
The Present and Future of CMP Technology
남철우(Chul Woo Nam),최기식(Ki Sik Choi),김삼동(Sam Dong Kim),김정태(Chung Tae Kim)
한국공업화학회
1999.09
공업화학전망
vol. 2 iss. 3
11-24(14pages)
UCI
I410-ECN-0102-2009-570-009445748
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