Thin reflective Ag films are synthesized by using sputter methods. For the purposes of improving the reflectance and adhesion of such films, particularly, the substrate bias voltages were applied during sputtering. We succeeded in fabricating a quality silver film which possesses an adhesion of 50 Kgf/㎠ and a high reflectivity of more than 96%. Both of reflectivity and adhesion are better in case of bias sputtering as controlled than nonbias sputtering, specifically the bias of 50-100 V has been shown most effective. The microstructures of sample films were examined by using various techniques and the XRD spectrum in particular showed that $lt;111$gt; direction was the preferred growth orientation.