Accurate control of the growth direction of carbon nanotubes (CNTs) during chemical vapor deposition is demonstrated. The CNT growth in a dc plasma enhanced CVD process is guided by the directions of the electric field inside of the plasma sheath. By careful control of the cathode geometry utilizing movable conductor plates, the electric field directions can be controlled to allow the growth of CNTs over a large range of angles. Calculated electrostatic field diagrams predict electric field directions which correspond well with experimental growth results, showing that a predictable control over the CNT growth orientations is possible. Such control is an important step toward fabricating CNTs with desired configurations and utilizing them for various technical applications.