Generally, the density of films deposited by evaporation techniques are lower than sputtering, due to the lower kinetic energy of the evaporated atoms (or ions). The authors report an enhancement of the kinetic energy by increasing the chamber pressure with an inert gas (e.g., Ar). The validity of the idea has been proved with permalloy(NiN_(80)Fe_(20))/Cu multilayer films, of which the quality was characterized using synchrotron X-ray and atomic force microscopy.