High energy product Nd2Fe(14)B films were grown onto Si(100) substrate by a KrF pulsed laser ablation using the targets of Nd(x)Fe(90.98-x)B(9.02) (x=17.51~27.51). The films of the Nd2Fe(14)B single phase did not exhibit a preferred orientation. However, [221], [006] and [222] axes were prominent for the films grown at the substrate temperature above 680℃ by using the target of Nd(27.51)Fe(63.47)B(9.02). This condition provided superior magnetic properties along the out-of-plane direction of films resulting in the magnetic properties of 4πMr(x)≡7kG, 4πM(r)≡4kG, and iH(c)≡1000 Oe. The deposition rate wasnt influenced much by changing the substrate temperature (T8), but it increased linearly by increasing the beam energy density. The beam density of 3J/㎠ created the optimal condition for the highest 4πM(r), and iH(c) simultaneously. The higher content of Nd induced a higher coercivity and concentration of 4πM(r), at the same time due to the finer grain size without a prominent change in 4πM(r), The films of x=27.5l exhibited a grain size of less than 12 nm while that of x=17.51 produced a size about 15 nm.