Fe₂O₃-TiO₂ films were formed by MOCVD technique, and their corrosion resistance and photoelectrochemical property were examined in acidic, neutral and alkaline solutions. The corrosion resistance was examined by an anodic polarization test, and the photocurrent response by a photoelectrochemical polarization test. The photocurrent and quantum yield maximum of the films depended on the titanium cationic fraction(X_η) in the films. They decreased in the range of X_η=0.0-0.70, then increased in the range of X_(Ti)=0.70-0.95, and finally decreased in the range of X_(Ti)=0.95-1.0 with increasing X_η value. The increase in the photocurrent and quantum yield maximum in the range of X_η=0.70-0.95 was attributed to the amorphous structure. Such a change in the photocurrent and quantum yield maximum was independent to the solution pH. The corrosion resistance of the films increased with increasing X_η value of the film in acidic, neutral and alkaline solutions. Therefore, the films with X_η=0.70-0.95 can be concluded to have high photocurrent response and high corrosion resistance.