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18.97.9.171
한국어
ENG
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한국전기전자재료학회
E²M-전기 전자와 첨단 소재
TFT Application of Low - Temperature Deposited Cat - CVD Polysilicon Films
TFT Application of Low - Temperature Deposited Cat - CVD Polysilicon Films
( H . Matsumura )
한국전기전자재료학회
1998.12
E²M-전기 전자와 첨단 소재
vol. 11 iss. 12
77-77(1pages)
UCI
I410-ECN-0102-2008-560-001249122
₩ 1,000
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