Plasma Enhaned Selective Area Microcrystalline Silicon : Surface Modification for Controlled Nucleation

( L . L . Smith , W . W . Read , C . S . Yang , E . Srinivasan , C . H . Courtney , H . H . Lamb , G . N . Parsons )

한국전기전자재료학회 1998.12

E²M-전기 전자와 첨단 소재 vol. 11 iss. 12 76-76(1pages)

UCI I410-ECN-0102-2008-560-001249162

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