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18.97.9.169
18.97.9.169
화학증착법에 의한 알루미나이드 코팅층의 형성
Aluminide Coatings on IN713C by Chemical Vapor Depostion
손희식 , 홍석호 , 김문일 ( H . S . Sohn , S . H . Hong , M . I . Kim )
UCI I410-ECN-0102-2009-570-007370717

The purpose of this study is to clarify the influence of the reaction temperature and AlCl₃content on the aluminide coating formation on Ni-based superalloy IN713C in CVD process and to compare its throwing power with that of Pack Cementation process. Aluminide coating was formed by CVD in hot-wall stainless tube reactor from an AlCl₃-H₂mixture in the temperature range 850∼1050℃. At reaction temperature 850℃, the coating thickness and the content of aluminium at the surface were increased as AlCl₃heating temperature was raised. At reaction temperature 1050℃, they were not influenced by the variation of AlCl₃heating temperature. When AlCl₃heating temperature was fixed 125℃, the phases of the coatings were varied from Ni₂Al₃to Al-rich NiAl and to Ni-rich NiAl with the reaction temperature. Therefore, in this stucy the reaction temperature has been found to be a major factor in determining the phase formed in CVD process. The throwing power of CVD was superior to that of Pack Cementation.

[자료제공 : 네이버학술정보]
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