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18.97.9.169
18.97.9.169
PACVD로 증착된 TiN 박막의 밀착성에 관하여
Influence of Parameters on Adhesion Strength on TiN Film by using R . F . Plasma Assisted Chemical Vapor Deposition.
신영식 , 김문일 ( Y . S . Shin , M . I . Kim )
UCI I410-ECN-0102-2009-570-007369196

In this study, TiN film was deposited onto steel by R.F.-PACVD in order to investigate the influence of parameters on the adhesion strength between film and substrate. Experimental results showed that adhesion strength by SAT is different from by optical microscopy. Adhesion strength is increased when the deposition temperature increases and is influenced by R.F. power and electrode distance. Especially heat treatment on the substrate has influenced over the adhesion strength, so it showed the 22 Newtons in adhesion strength by SAT and adhesion strength is decreased when deposition thickeness is thick and hardness is high. Also if the film is thick and high hardness simultaneous, the film was delaminated seriously.

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