본문 바로가기
216.73.217.86
216.73.217.86
CHF3 와 SiH4 혼합기체를 이용하여 제조된 플라즈마 고분자막의 투과특성
The Permeation Characteristics of Plasma Polymerization of Mixtures of CHF3 and SiH4
현상원 ( Sang Won Hyun ) , 전법주 ( Bup Ju Jeon ) , 이재동 ( Jae Dong Lee ) , 정일현 ( Il Hyun Jung )
응용화학 2권 1호 214-217(4pages)
UCI I410-ECN-0102-2009-570-007307750
이 자료는 4페이지 이하의 자료입니다.

Thin plasma polymer layers were produced employing feed gas of CHF₃(trifluoromethane) and SiH₄ in an rf-plasma reactor respectively. The CHF₃ and SiH₄ were plasma-polymerized to yield films containing both fluorine and silicon residues. The plasma polymer membrane was investigated by elemental analysis, FT-IR(infrared spectroscopy), SEM(scanning electron microscopy) and XPS (X-ray photoelectron spectra) for physico-chemical analysis. The elemental composition of the formed polymers depended on the composition of the starting gases.

[자료제공 : 네이버학술정보]
×