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한국공업화학회
한국공업화학회 연구논문 초록집
RTCVD 장치를 이용한 3C - SiC (111) 박막의 성장 및 분석
RTCVD 장치를 이용한 3C - SiC (111) 박막의 성장 및 분석
서영훈 , 남기석
한국공업화학회
1996.12
한국공업화학회 연구논문 초록집
vol. 1996
164-164(1pages)
UCI
I410-ECN-0102-2009-570-007291195
₩ 0
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