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한국어
ENG
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대한금속재료학회
Advanced Material and Processing
CHARACTERIZATION OF Si3N4 / Ni INTERFACE BY MEANS OF X-RAY MICRODIFFRACTOMETRY , SEM AND EDS
CHARACTERIZATION OF Si3N4 / Ni INTERFACE BY MEANS OF X-RAY MICRODIFFRACTOMETRY , SEM AND EDS
Q . Chen , S . Coniglione , C . Patuelli , A . Bellosi , L . Esposito , G . C . Celotti
대한금속재료학회
1995.01
Advanced Material and Processing
vol. 3
2693-2699(7pages)
UCI
I410-ECN-0102-2009-580-007446081
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