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18.97.9.169
18.97.9.169
SCIE SCOPUS
TiCxN1-x 박막의 플라즈마 화학증착시 CH4/N2 입력분율이 증착특성에 미치는 영향
Effect of Ch4/N2 Inlet Fraction on the Deposition Characteristics of TiCxN1-x Coatings Deposited by PECVD
최동준(Dong Jun Choi), 남옥현(Ok Hyun Nam), 김문일(Moon Il Kim)
UCI I410-ECN-0102-2008-580-001839484

TiC_xN_(1-x) coatings were deposited on high speed steel and Si substrates by PECVD with CH₄/N₂ inlet fraction of 0.3, 0.4, 0.5 and 0.6. The chemical composition, surface and fracture cross-section morphology, preferred orientation and microhardness of the coatings were analyzed. It has been found that the compostiion of TiC_xN(1-x) coatings was changed from TiC_(0.54)N_(0.46) to TiC_(0.60)N_(0.40) with an increas of CH₄/N₂ inlet fraction. When CH₄/N₂ inlet fraction was small, TiC_xN_(1-x) coating showed the columnar grains with a domed top. The faceted columnar grains, however, began to develop with the increase of CH₄/N₂ inlet fraction. The grain size increased as well. At CH₄/N₂=0.3, the coatings had (200) preferred orientation, while no preferred orientation was observed at CH₄/N₂=0.6. It is suggested that these results are caused by enhanced adatom mobility and surface diffusion with CH₄/N₂ inlet fraction.

[자료제공 : 네이버학술정보]
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