A study has been made of the fabrication condition for obtaining the cube texture of high purity aluminum foils and of electrochemical etching of the aluminum foil. The cube texture of high purity aluminum foils of 110㎛ in thickness was obtained by cold rolling, followed by annealing above 400℃ for 1 hour under vacuum. The microstructures of the cold rolled and heat treated aluminum foils were studied. The effects of current density and chloride ion concentration on the etch pit morphology and capacitance were studied. The etch tunnel size decreases and the etch tunnel density increases with increasing current density and chloride ion concentration.