18.97.9.171
18.97.9.171
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MOCVD 반응기의 샤워헤드의 구조가 박막증착속도의 균일도에 미치는 영향
Effect of the Showerhead Structure of MOCVD Reactor on the Uniformity of Deposition Rate of Thin Film
정원영(Won Young Chung), 김도현(Do Hyun Kim)
UCI I410-ECN-0102-2008-570-001917530
This article is 4 pages or less.
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