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18.97.14.83
한국어
ENG
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한국화학공학회
한국화학공학회 추계학술발표논문집
ECR Plasma 를 이용한 CF4 / O2 혼합기체에 의한 Si 의 식각
ECR Plasma 를 이용한 CF4 / O2 혼합기체에 의한 Si 의 식각
Silicon Etching in CH4 / O2 Gas Mixture using Electron Cyclotron
윤민희 , 남기석 , 이상목 , 이기방 ( Min Hee Yun , Kee Suk Nahm , Sang Mook Lee , Kee Bang Lee )
한국화학공학회
1991.01
한국화학공학회 추계학술발표논문집
vol. 1991
232-232(1pages)
UCI
I410-ECN-0102-2008-570-001938720
₩ 1,000
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