18.97.14.85
18.97.14.85
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Uniform Sputter - Deposition of Titanium Nitride Thin Films by Using New Magnetron Discharge
Yoshinobu MATSUDA , Kiyoshi KUWAHARA , Hiroshi FUJIYAMA
UCI I410-ECN-0102-2008-560-002009640
This article is 4 pages or less.
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